发明名称 STENCILS FOR HIGH-THROUGHPUT MICRON-SCALE ETCHING OF SUBSTRATES AND PROCESSES OF MAKING AND USING THE SAME
摘要 <p>The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.</p>
申请公布号 SG185549(A1) 申请公布日期 2012.12.28
申请号 SG20120083515 申请日期 2011.05.21
申请人 NANO TERRA INC.;MERCK PATENT GESELLSCHAFT MIT 发明人 STERN, ERIC;BLANCHET, GRACIELA, BEATRIZ;HUNTING, LINDSAY;MAYERS, BRIAN, T.;MCLELLAN, JOSEPH, M.;REUST, PATRICK;KUEGLER, RALF;GILLIES, JENNIFER
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