发明名称 |
REDUCTION OF COPPER OR TRACE METAL CONTAMINANTS IN PLASMA ELECTROLYTIC OXIDATION COATINGS |
摘要 |
<p>A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen- comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.</p> |
申请公布号 |
SG185744(A1) |
申请公布日期 |
2012.12.28 |
申请号 |
SG20120086500 |
申请日期 |
2011.06.01 |
申请人 |
MKS INSTRUMENTS, INC. |
发明人 |
CHEN, XING;JI, CHENGXIANG;TAI, CHIU-YING |
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