发明名称 GAN SUBSTRATE AND MANUFACTURE METHOD THE SAME
摘要 PURPOSE: A GaN substrate and a manufacturing method thereof are provided to automatically separate a second GaN layer from a base substrate by growing a first GaN layer which induces a crack in a cooling process. CONSTITUTION: A base substrate(210) is prepared(S210). A first GaN layer(220) is grown on the base substrate(S220). A buffer layer(230) is grown on the first GaN layer(S230). A second GaN layer(240) is grown on the buffer layer(S240).
申请公布号 KR20120140002(A) 申请公布日期 2012.12.28
申请号 KR20110059585 申请日期 2011.06.20
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 CHOI, JUN SUNG;PARK, HYUN JONG;LEE, WON JO;BAE, JUN YOUNG;PARK, CHEOL MIN;LEE, DONG WOOK
分类号 H01L21/20;H01L33/00 主分类号 H01L21/20
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