| 摘要 |
The invention relates to a system (100) for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber (102) and a set of two coils (120a; 120b). The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis. |
