| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure the positional information of a moving body with high accuracy when compared with a conventional interferometer. <P>SOLUTION: The exposure device comprises a stage WST moving in the XY plane while holding a substrate and having a reflection surface 134 intersecting the XY plane, and a measurement device 20Y'. The measurement device 20Y' has a fixed scale 135 disposed above the stage WST and returning a light beam incident via the reflection surface 134 back to the reflection surface 134 while diffracting, and a detection unit (124A, 124B, 126, 28) which detects the light beam returned back to the reflection surface 134. The measurement device measures the position of the stage WST in the Y axis direction, by detecting the interference light of a plurality of diffraction beams of the light beam, obtained by making a return beam from the fixed scale 135 to be reflected again on the reflection surface 134. <P>COPYRIGHT: (C)2013,JPO&INPIT |
