发明名称 ANTENNA UNIT FOR INDUCTION COUPLING PLASMA AND INDUCTION COUPLING PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an antenna unit for an induction coupling plasma which can perform plasma distribution control in an outside region of a square substrate. <P>SOLUTION: In an antenna unit 50, a portion forming an inductive electric field of an antenna 13 constitutes a square plane corresponding to a square substrate G as a whole, and the antenna contains a first antenna part 13a and a second antenna part 13b in which a plurality of antenna lines are wound in spiral. A plurality of antenna lines of the first antenna part 13a form four corner parts of the square plane and are provided to connect the four corner parts at a position different from that of the square plane. A plurality of antenna lines of the second antenna part 13b form central parts of four sides of the square plane and are provided to connect the central parts of the four sides at a position different from that of the square plane. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012256660(A) 申请公布日期 2012.12.27
申请号 JP20110127896 申请日期 2011.06.08
申请人 TOKYO ELECTRON LTD 发明人
分类号 H01L21/3065;H05H1/46 主分类号 H01L21/3065
代理机构 代理人
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