发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 A substrate has a surface made of a semiconductor having a hexagonal single-crystal structure of polytype 4H. The surface of the substrate is constructed by alternately providing a first plane having a plane orientation of (0-33-8), and a second plane connected to the first plane and having a plane orientation different from the plane orientation of the first plane. A gate insulating film is provided on the surface of the substrate. A gate electrode is provided on the gate insulating film.
申请公布号 US2012326166(A1) 申请公布日期 2012.12.27
申请号 US201213529602 申请日期 2012.06.21
申请人 MASUDA TAKEYOSHI;HARADA SHIN;WADA KEIJI;HIYOSHI TORU;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MASUDA TAKEYOSHI;HARADA SHIN;WADA KEIJI;HIYOSHI TORU
分类号 H01L29/24;H01L21/336;H01L29/78 主分类号 H01L29/24
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