INTERDIGITATED VERTICAL NATIVE CAPACITOR

摘要

A metal capacitor structure includes a plurality of line level structures vertically interconnected with via level structures. Each first line level structure and each second line level structure includes a set of parallel metal lines that is physically joined at an end to a rectangular tab structure having a rectangular horizontal cross-sectional area. A first set of parallel metal lines within a first line level structure and a second set of parallel metal lines within a second line level structure are interdigitated and parallel to each other, and can collectively form an interdigitated uniform pitch structure. Because the rectangular tab structures do not protrude toward each other within a region between two facing sidewalls of the rectangular tab structures, sub-resolution assist features (SRAFs) can be employed to provide a uniform width and a uniform pitch throughout the entirety of the interdigitated uniform pitch structure.