MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER MASK, REFLECTIVE MASK, AND METHOD FOR MAKING THESE

摘要

PROBLEM TO BE SOLVED: To provide a mask blank substrate, a mask blank and a transfer mask which, during grinding, make it possible to eliminate adverse effects on flatness due to a substrate mark comprising an oblique surface and make it possible to improve flatness, and also to provide a method for making these.

SOLUTION: A substrate mark 4 comprising an oblique surface is formed in a mask blank substrate 1, the angle of inclination of the substrate mark 4 with respect to a main surface 112 is greater than 45° but less than 90°, and the distance W1from the boundary of the substrate mark 4 with the main surface 112 to the outer periphery of the mask blank substrate 1 is less than 1.5 mm.

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