| 发明名称 |
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
A positive resist composition including: a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid; an acid generator component (B) which generates acid upon exposure; a fluorine-containing compound component (F); and a photosensitizer (G).
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| 申请公布号 |
US2012328982(A1) |
申请公布日期 |
2012.12.27 |
| 申请号 |
US201213476352 |
申请日期 |
2012.05.21 |
| 申请人 |
IWASAWA YUTA;ENDO KOTARO;KOROSAWA TSUYOSHI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
IWASAWA YUTA;ENDO KOTARO;KOROSAWA TSUYOSHI |
| 分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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