发明名称 METHOD OF MAKING SEMICONDUCTOR MATERIALS AND DEVICES ON SILICON SUBSTRATE
摘要 A crystalline structure comprising a substrate, which has a surface. The surface has one or more wells formed therein defining one or more growing area and at least one layer of dissimilar crystalline material epitaxially grown on the growing area. A method of making a crystalline structure having a low threading dislocation density comprising the steps of (a) patterning a surface of a substrate material such that one or more wells defining a growing area is formed therein; and (b) epitaxially growing at least one strained layer of dissimilar crystalline material on the growing area of the surface of the substrate material, such that the threading dislocation density of the at least one strained layer is reduced by the one or more wells.
申请公布号 US2012326210(A1) 申请公布日期 2012.12.27
申请号 US201113168290 申请日期 2011.06.24
申请人 SHI ZHISHENG 发明人 SHI ZHISHENG
分类号 H01L29/04;H01L21/20 主分类号 H01L29/04
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