发明名称 |
Transmission Line RF Applicator for Plasma Chamber |
摘要 |
A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor. |
申请公布号 |
US2012326592(A1) |
申请公布日期 |
2012.12.27 |
申请号 |
US201113282469 |
申请日期 |
2011.10.27 |
申请人 |
KUDELA JOZEF;TANAKA TSUTOMU;SORENSEN CARL A.;ANWAR SUHAIL;WHITE JOHN M.;SHINDE RANJIT INDRAJIT;CHO SEON-MEE;TRUONG DOUGLAS D. |
发明人 |
KUDELA JOZEF;TANAKA TSUTOMU;SORENSEN CARL A.;ANWAR SUHAIL;WHITE JOHN M.;SHINDE RANJIT INDRAJIT;CHO SEON-MEE;TRUONG DOUGLAS D. |
分类号 |
H05H1/24;H01P3/00 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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