发明名称 GRAPHENE-LAYERED STRUCTURE, METHOD OF PREPARING THE SAME, AND TRANSPARENT ELECTRODE AND TRANSISTOR INCLUDING GRAPHENE-LAYERED STRUCTURE
摘要 A method of directly growing graphene of a graphene-layered structure, the method including ion-implanting at least one ion of a nitrogen ion and an oxygen ion on a surface of a silicon carbide (SiC) thin film to form an ion implantation layer in the SiC thin film; and heat treating the SiC thin film with the ion implantation layer formed therein to graphenize a SiC surface layer existing on the ion implantation layer.
申请公布号 US2012326128(A1) 申请公布日期 2012.12.27
申请号 US201213530656 申请日期 2012.06.22
申请人 SHIN HYEON-JIN;CHOI JAE-YOUNG;AHN JOUNG-REAL;SEO JUNG-TAK;SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN HYEON-JIN;CHOI JAE-YOUNG;AHN JOUNG-REAL;SEO JUNG-TAK
分类号 H01L21/20;B32B9/04;B82Y30/00;H01L29/16 主分类号 H01L21/20
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