METHOD FOR DUPLICATING PATTERN USING EXPOSURE PROCESS ON CYLINDRICAL MOLD

摘要

The present invention relates to a method for duplicating a pattern using an exposure process on a cylindrical mold, and more specifically, to duplicating a pattern on a cylindrical mold, a method for duplicating a pattern using an exposure process on a cylindrical mold for generating a symmetrical pattern or an identical pattern using a cylindrical mold having a pattern generated thereon. The method for duplicating a pattern using an exposure process on a cylindrical mold comprises: a first step for coating an ink on a pattern of an original mold; a second step for generating a pattern by having the ink coated on the pattern of the original mold be printed on a duplicate mold uniformly coated with a photosensitizer; a third step for UV exposing and developing the duplicate mold; and a fourth step for etching the duplicate mold.