| 发明名称 |
METHOD OF MANUFACTURING MULTILAYER BODY, METHOD OF PROCESSING SUBSTRATE, AND MULTILAYER BODY |
| 摘要 |
<p>A separation layer (3), which is provided between a substrate (1) and a support plate (4), and the quality of which is made to change when absorbing light irradiated thereupon via the support plate (4), is formed by executing a plasma CVD method using high frequency power that is set so as to become greater than a power that will cause a mode jump to happen.</p> |
| 申请公布号 |
WO2012176607(A1) |
申请公布日期 |
2012.12.27 |
| 申请号 |
WO2012JP64239 |
申请日期 |
2012.05.31 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD.;FUJII, YASUSHI;MITAKE, TATSUHIRO;MATSUSHITA, ATSUSHI |
发明人 |
FUJII, YASUSHI;MITAKE, TATSUHIRO;MATSUSHITA, ATSUSHI |
| 分类号 |
H01L21/02;C23C16/505;H01L21/304;H01L21/683 |
主分类号 |
H01L21/02 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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