| 发明名称 |
UNDERLAYER COMPOSITION AND PROCESS THEREOF |
| 摘要 |
The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
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| 申请公布号 |
US2012328990(A1) |
申请公布日期 |
2012.12.27 |
| 申请号 |
US201113164869 |
申请日期 |
2011.06.21 |
| 申请人 |
YAO HUIRONG;LIN GUANYANG;BOGUSZ ZACHARY;LU PINGHUNG;KIM WOOKYU;NEISSER MARK;AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
YAO HUIRONG;LIN GUANYANG;BOGUSZ ZACHARY;LU PINGHUNG;KIM WOOKYU;NEISSER MARK |
| 分类号 |
G03F7/20;C08K5/04 |
主分类号 |
G03F7/20 |
| 代理机构 |
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