发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination optical system having high degree of freedom with respect to change of a polarization state. <P>SOLUTION: An illumination optical system for irradiating an irradiation target surface with light from a light source has: a spatial optical modulator which includes plural optical elements which are arranged within a predetermined plane and individually controlled, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system; and a polarization unit which is disposed in an optical path between the spatial optical modulator and the light source or a conjugation space which contains a plane optically conjugated with a predetermined plane and is disposed in the optical path to be nearer to the irradiation target plane side than the spatial optical modulator, and which has a rotatable first wavelength plate acting on a partial light flux out of a propagation light flux propagating on the optical path. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012256742(A) 申请公布日期 2012.12.27
申请号 JP20110129232 申请日期 2011.06.09
申请人 NIKON CORP 发明人 INOUE KAORU;OKI YASUSHI
分类号 H01L21/027 主分类号 H01L21/027
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