SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING UNIT

摘要

PURPOSE: A substrate processing method and a substrate processing unit are provided to optimally control a moving speed of a fluid nozzle in consideration of a factor like processing time and amount. CONSTITUTION: A fluid nozzle is moved from the center of a rotating substrate to the surrounding. Fluid is sprayed from the fluid nozzle to the surface of the rotating substrate. The fluid nozzle moves from the center of the substrate to a preset position with an initial movement speed. The fluid nozzle moves from the preset position with a moving speed(V(r)) that satisfies V(r)×rα= C(integer). The V(r) is a moving speed of the fluid nozzle passing the corresponding position to the r distance of the substrate from the center of the substrate. Theαis a power index.