发明名称 |
METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.
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申请公布号 |
US2012328993(A1) |
申请公布日期 |
2012.12.27 |
申请号 |
US201213491860 |
申请日期 |
2012.06.08 |
申请人 |
UTSUMI YOSHIYUKI;DAZAI TAKAHIRO;ARAI MASATOSHI;KAIHO TAKAAKI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
UTSUMI YOSHIYUKI;DAZAI TAKAHIRO;ARAI MASATOSHI;KAIHO TAKAAKI |
分类号 |
C08F228/06;C08F8/34;C08F228/02;G03F7/20 |
主分类号 |
C08F228/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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