| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition method of a selenium thin film, a vapor deposition apparatus of a selenium thin film, and a plasma head capable of performing vapor deposition of a selenium thin film without using a vacuum apparatus while maintaining high utilization efficiency of a selenium source. <P>SOLUTION: The vapor deposition method of the selenium thin film includes the steps of: providing the plasma head 200; supporting a substrate under atmospheric pressure; and performing vapor deposition of the selenium thin film on the substrate by dissociating the solid selenium source using the plasma head. The vapor deposition apparatus 1 of the selenium thin film includes: a support 100 which supports the substrate; and the plasma head which holds the solid selenium source and is arranged on the support so that they are movable relative to each other, wherein the plasma head dissociates the solid selenium source and performs vapor deposition of the selenium thin film on the substrate. The plasma head includes a chamber in which plasma is produced, a housing which is connected to the chamber so as to surround the chamber, and the solid selenium source which is arranged in the housing. <P>COPYRIGHT: (C)2013,JPO&INPIT |
