发明名称 |
Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method |
摘要 |
According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.
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申请公布号 |
US2012328985(A1) |
申请公布日期 |
2012.12.27 |
申请号 |
US201213524627 |
申请日期 |
2012.06.15 |
申请人 |
KATO MISUGI;ISONO YOSHIMI;NARIZUKA SATORU;TAKIHANA RYOZO;MORI KAZUNORI;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
KATO MISUGI;ISONO YOSHIMI;NARIZUKA SATORU;TAKIHANA RYOZO;MORI KAZUNORI |
分类号 |
C08F228/04;C07C309/12;C07C381/12;C07D207/46;C07D209/48;C07D333/08;C07D333/76;C08F228/02;G03F7/004;G03F7/20 |
主分类号 |
C08F228/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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