Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots

摘要

The illumination system (12) comprises a pupil plane, a pupil forming unit, and an array of reflective or translucent light deflection elements. The light deflection angle of the light spots generated by each of the light deflection elements is set variable in the pupil plane. At least two light deflection elements generate two respective light spots whose intensity differs from each other by the polarization state of light spots. An independent claim is included for a method of operating a micro-lithographic projection exposure apparatus.