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发明名称
METHOD OF PRODUCING TEMPLATE FOR EPITAXIAL GROWTH AND NITRIDE SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20120139855(A)
申请公布日期
2012.12.27
申请号
KR20127030513
申请日期
2010.06.07
申请人
SOKO KAGAKU CO., LTD.
发明人
KIM, MYUNG HEE
分类号
H01L21/20;H01L21/205;H01L33/32
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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