| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask forming method for easily forming an etching mask on a surface of an antireflection film which covers a spherical photoelectric conversion element. <P>SOLUTION: In a mask forming method, an upper die 1 and lower die 2 are used. When the upper die 1 and lower die 2 are connected, a cavity corresponding to a contour of a spherical photoelectric conversion element E is defined, hollows 1b and 2b are formed on joint surfaces 1a and 2a of the upper die 1 and lower die 2 respectively, and projections and recesses are formed all over the surfaces of the hollows. A mask forming method comprises steps of: filling each recess formed on the hollows with an organic substance 7; connecting the upper and lower dies together so that the photoelectric conversion element covered with an antireflection film AR is held in the cavity and pressure-welding each projection formed on the hollows to the antireflection film; and transferring the organic substance to the surface of the antireflection film AR by heating the upper and lower dies. <P>COPYRIGHT: (C)2013,JPO&INPIT |
