发明名称 SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor laser having high current constriction effect in which a current constriction layer can be formed without taking out a wafer by interrupting the crystal growth, and to provide a manufacturing method therefor. <P>SOLUTION: In a semiconductor laser 1 having a current constriction layer, the current constriction layer consists of an n++ junction layer 19 doped with n-type impurity atoms, an insulation layer 17, and a p++ junction layer 15 doped with p-type impurity atoms. The p++ junction layer 15 has a center part 15a thicker than a peripheral part 15b, and the n++ junction layer 19 comes into contact with the p++ junction layer 15 in the center part 15a to form a tunnel junction. The insulation layer 17 separates the n++ junction layer 19 and the p++ junction layer 15 in the peripheral part 15b. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012256635(A) 申请公布日期 2012.12.27
申请号 JP20110127402 申请日期 2011.06.07
申请人 DENSO CORP 发明人 YAMADA HITOSHI;MATSUSHITA NORIYUKI
分类号 H01S5/323;H01S5/183 主分类号 H01S5/323
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