| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of processing a material with high mechanical strength into a highly accurate surface texture required for a substrate used in a next generation hard disk, at low cost, by a polishing process to obtain the same polishing effect as using cerium oxide, as an alternative cerium oxide for a free abrasive grain in a polishing liquid. SOLUTION: A manufacturing method of a substrate for an information recording medium is a manufacturing method of a substrate for an information recording medium comprising a polishing process for polishing a plate-like inorganic material consisting of a glass or crystallized glass containing at least SiO<SB POS="POST">2</SB>component by using a polishing liquid and a polishing pad. The polishing liquid at least contains an abrasive grain consisting of a compound containing Zr and Si, an abrasive grain concentration in the polishing liquid is in the range of 2 wt% to 40 wt%, the content of the abrasive grain consisting of a compound containing Zr and Si is 70 wt% or more with respect to the total weight of the abrasive grains in the polishing liquid, and the processing pressure in the above polishing process is 120 g/cm<SP POS="POST">2</SP>to 160 g/cm<SP POS="POST">2</SP>. COPYRIGHT: (C)2013,JPO&INPIT |
