发明名称 |
TECHNIQUES FOR PROCESSING A SUBSTRATE |
摘要 |
<p>Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise directing an ion beam comprising a plurality of ions along an ion beam path, from an ion source to the substrate; disposing at least a portion of a mask in the ion beam path, between the ion source and the substrate; and translating one of the substrate and the mask relative to other one of the substrate and the mask.</p> |
申请公布号 |
EP2417622(A4) |
申请公布日期 |
2012.12.26 |
申请号 |
EP20100762436 |
申请日期 |
2010.04.08 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES |
发明人 |
DANIELS, KEVIN, M.;LOW, RUSSELL, J.;RIORDON, BENJAMIN, B. |
分类号 |
H01L21/266;H01J37/317;H01L31/18 |
主分类号 |
H01L21/266 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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