TEXTURING METHOD FOR USING DOUBLE TEXTURING METHOD OF POLYCRYSTAL SILICON WAFER FOR SOLAR CELL

摘要

PURPOSE: A texturing method using a double surface organizing mode of a polycrystalline silicon wafer for a solar cell is provided to low reflectivity by etching the surface of silicon by disassembling to plasma using fluorinated gas. CONSTITUTION: A hole(3) is formed on the surface of a polycrystalline silicon wafer(1). The hole is formed with laser. A wet etching process is performed on the surface of the polycrystalline silicon wafer. The surface of the polycrystalline silicon wafer is disassembled to plasma using fluorinated gas. A dry etching process is performed on the disassembled surface.