| 摘要 |
PURPOSE: A liquid processing apparatus and a liquid processing method are provided to prevent a substrate from being contaminated due to foreign materials attached to a leading tip of a nozzle support arm in a processing chamber by cleaning the nozzle support arm using an arm cleaning unit. CONSTITUTION: A processing chamber includes a substrate holding unit which holds a substrate. A nozzle(82a) sprays fluid to the substrate held by the substrate holding unit. A nozzle support arm(82) supports the nozzle and includes an inner pipe(82b) to send the fluid to the nozzle. A gas spray unit(75) sprays gas to a leading tip(82e) of the nozzle support arm. |
