发明名称 Double-sided semiconductor structure and method for manufacturing the same
摘要 A semiconductor structure (100; 200; 300) comprising; a substrate (5; 302) of semiconductor material of a first type of conductivity; a first semiconductor layer (7) set in direct electrical contact with the substrate on a first side (2) of the substrate; a second semiconductor layer (8) set in direct electrical contact with the substrate on a second side (4) of the substrate; a first active electronic device (10; 303) formed in the first semiconductor layer (7); and a second active electronic device (12; 62; 305) formed in the second semiconductor layer (8).
申请公布号 EP2317553(B1) 申请公布日期 2012.12.26
申请号 EP20100188931 申请日期 2010.10.26
申请人 STMICROELECTRONICS SRL 发明人 MICCICHE', MONICA;GRIMALDI, ANTONIO GIUSEPPE;BAZZANO, GAETANO;FRAZZETTO, NICOLO
分类号 H01L27/06;H01L29/78 主分类号 H01L27/06
代理机构 代理人
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