发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of treating an alkali metal salt of an organic sulfonic acid capable of reducing the concentration of metallic ions to a level suitable for use in the field of electronics, semiconductors, precision machining or the like, an organic sulfonic acid having a reduced concentration of metallic ions prepared by the above treatment method, and a surfactant of an ammonium organosulfonate type having a similarly reduced concentration of metallic ions by using the above prepared organic sulfonic acid. <P>SOLUTION: A specific alkali metal salt of an organic sulfonic acid is subjected to an ion-exchange treatment that employs a strongly acidic cation exchange resin to reduce the concentration of each of metallic ions contained therein relative to the organic sulfonic acid to 200 ppb or lower. The resulting organic sulfonic acid having a reduced concentration of metallic ions is neutralized by a specific alkaline compound to obtain a surfactant of an ammonium organosulfonate type having a similarly reduced concentration of metallic ions. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP5105599(B2) 申请公布日期 2012.12.26
申请号 JP20070322732 申请日期 2007.12.14
申请人 发明人
分类号 C07C303/44;B01J39/04;C07C309/04;C07C309/30;C07C309/36;C07C309/42;C09K3/00 主分类号 C07C303/44
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