| 发明名称 |
Sodium salt containing CIG targets, methods of making and methods of use thereof |
| 摘要 |
A sputtering target includes at least one metal selected from copper, indium and gallium and a sodium containing compound. |
| 申请公布号 |
US8338214(B2) |
申请公布日期 |
2012.12.25 |
| 申请号 |
US201113073159 |
申请日期 |
2011.03.28 |
| 申请人 |
JULIANO DANIEL R.;TAS ROBERT;MACKIE NEIL;ZIANI ABDELOUAHAB;MIASOLE |
发明人 |
JULIANO DANIEL R.;TAS ROBERT;MACKIE NEIL;ZIANI ABDELOUAHAB |
| 分类号 |
H01L31/032 |
主分类号 |
H01L31/032 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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