发明名称 Semiconductor electronic device having reduced threading dislocation and method of manufacturing the same
摘要 A semiconductor electronic device comprises a substrate; a buffer layer formed on said substrate, having two or more layers of composite layers in which a first semiconductor layer comprising nitride based compound semiconductor having smaller lattice constant and greater coefficient of thermal expansion than the substrate and a second semiconductor layer comprising nitride based compound semiconductor having smaller lattice constant and smaller coefficient of thermal expansion than the first semiconductor layer are alternately laminated; a semiconductor operating layer comprising nitride based compound semiconductor formed on said buffer layer; a dislocation reducing layer comprising nitride based compound semiconductor, formed in a location between a location directly under said buffer layer and inner area of said semiconductor operating layer, and comprising a lower layer area and an upper layer area each having an uneven boundary surface, wherein threading dislocation extending from the lower layer area to the upper layer area is bent at said boundary surface.
申请公布号 US8338859(B2) 申请公布日期 2012.12.25
申请号 US20090569429 申请日期 2009.09.29
申请人 KOKAWA TAKUYA;KATO SADAHIRO;SATO YOSHIHIRO;IWAMI MASAYUKI;FURUKAWA ELECTRIC CO., LTD 发明人 KOKAWA TAKUYA;KATO SADAHIRO;SATO YOSHIHIRO;IWAMI MASAYUKI
分类号 H01L21/02;H01L21/338 主分类号 H01L21/02
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