发明名称 Selective epitaxial growth of semiconductor materials with reduced defects
摘要 A semiconductor device includes a substrate formed of a first semiconductor material; two insulators on the substrate; and a semiconductor region having a portion between the two insulators and over the substrate. The semiconductor region has a bottom surface contacting the substrate and having sloped sidewalls. The semiconductor region is formed of a second semiconductor material different from the first semiconductor material.
申请公布号 US8338884(B2) 申请公布日期 2012.12.25
申请号 US20100708711 申请日期 2010.02.19
申请人 LIN JING-CHENG;YU CHEN-HUA;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIN JING-CHENG;YU CHEN-HUA
分类号 H01L21/00 主分类号 H01L21/00
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