发明名称 |
Fluorine-passivated reticles for use in lithography and methods for fabricating the same |
摘要 |
Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through the fluorine-passivated reticle to the target semiconductor wafer. In another embodiment, a fluorine-passivated reticle comprises a substrate and a patterned fluorine-passivated absorber material layer overlying the substrate. According to another embodiment, a method for fabricating a reticle for use in photolithography comprises providing a substrate and forming a fluorine-passivated absorber material layer overlying the substrate. |
申请公布号 |
US8338061(B2) |
申请公布日期 |
2012.12.25 |
申请号 |
US201113158234 |
申请日期 |
2011.06.10 |
申请人 |
LEVINSON HARRY J.;OKOROANYANWU UZODINMA;TCHIKOULAEVA ANNA;WIRTZ RENE;ADVANCED MICRO DEVICES, INC. |
发明人 |
LEVINSON HARRY J.;OKOROANYANWU UZODINMA;TCHIKOULAEVA ANNA;WIRTZ RENE |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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