| 摘要 |
A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly, intermediate regions positioned on the opposite sides of the central region and having a re-entrant arcuate shape and end proximity regions each having a linear shape, and adhering a pellicle membrane whose tensile force distribution is adjusted so that a tensile force along the pair of long sides of the pellicle frame is larger than a tensile force along the pair of short sides of the pellicle frame, thereby transforming the one of short sides of the pellicle frame to which the pellicle membrane is adhered to have a linear shape.
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