A METHOD FOR INITIALIZING A DEPOSITION CHAMBER, A METHOD FOR REMOVING POLLUTIONS IN A CHAMBER AND A METHOD FOR MANUFACTURING A CHAMBER

摘要

PURPOSE: A method for initializing a deposition chamber and a method for removing contaminants from the chamber, and a chamber manufacturing method are provided to initialize the chamber within a short time by using a light source arranged inside the chamber to provide lights that gasify inner contaminants in the chamber. CONSTITUTION: A method for initializing a chamber(700) comprises the steps of: washing the chamber with electrolyte, cleaning the washed chamber with solvent, arranging a light source(100) in the cleaned chamber, irradiating the inside of the chamber with lights from the light source, and discharging the interior gas from the chamber using a vacuum pump.