发明名称 HOLLOW SILICA PARTICLES, METHOD OF PREPARING THE SAME AND LOW-REFLECTION COATINGS USING THE SAME
摘要 PURPOSE: Hollow silica, a manufacturing method of the same, and a low reflective coating material manufactured using the same are provided to control the size of particles by synthesizing nanosilver crystals using polyol solvents with different viscosities. CONSTITUTION: A manufacturing method of hollow silica includes the following steps: nanosilver crystals are synthesized by using polyol solvents with adjusted viscosities; silica is coated on nanosilver crystals to synthesize silver-silica core-shell nanoparticles; and the silver cores of the silver-silica core-shell nanoparticles are etched. The polyol solvents are one or more selected from a group including ethylene glycol, 1,2-propanediol, 1,4-butanediol, or 1,5-pentanediol. The sizes of the nanosilver crystals are in a range between 30 and 50nm.
申请公布号 KR20120138195(A) 申请公布日期 2012.12.24
申请号 KR20110057572 申请日期 2011.06.14
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 PARK, O OK;IM, SANG HYUK;PARK, KEUM HWAN;KIM, DO YOUB;CHOI, KYEONG WOO
分类号 C01B33/18;C08J5/18;C08J7/04 主分类号 C01B33/18
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