| 摘要 |
PURPOSE: A pattern processing apparatus for a light guide plate is provided to prevent a scratch occurrence on the light guide plate which is generated from the contact with a carrier roller. The method thereof transfers the light guide plate, on which a cleaning work is conducted in a cleaner, to a pattern processing unit formed differently in height using a transferring means. CONSTITUTION: A pattern processing apparatus for a light guide plate comprises a cleaner and a transferring means(20). The transferring means comprises a first gripper(21), a second gripper(22), a gap adjuster(23), a lift operating unit(24), and a feeding unit(25). The first gripper and the second gripper grasp the both sides of the light guide plate complete with the cleaning work in the cleaner. The gap adjuster adjusts the gap between the first gripper and the second gripper and corresponds to the width of the light guide plate. A lift operating unit elevates the first gripper and the second gripper. The feeding unit transfers the light guide plate by the reciprocating rectilinear motion between the cleaner and the pattern processing unit. |
