发明名称 SEMICONDUCTOR MEMORY DEVICE HAVING THREE-DIMENSIONAL DOUBLE CROSS POINT ARRAY
摘要 <p>PURPOSE: A semiconductor memory device having a three-dimensional double cross point array and a manufacturing method thereof are provided to reduce pitches by half by forming two metal layers to be vertically crossed each other. CONSTITUTION: Three conducting wires define two cross points. Two memory cells(1a,1b) are arranged on two cross points. Three conducting wires comprise a first conducting wire(100), a second conducting wire(200), and a third conducting wire(500). First and second conducting wires are parallelly extended in a first horizontal direction. The third conducting wire is extended in a second horizontal direction which is crossed with the first horizontal direction.</p>
申请公布号 KR20120137862(A) 申请公布日期 2012.12.24
申请号 KR20110056994 申请日期 2011.06.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK, IN GYU;KIM, SUN JUNG
分类号 H01L27/10 主分类号 H01L27/10
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