| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for a solar cell, which shows a high sputtering rate at an early stage of sputtering, shows little deterioration of the sputtering rate over time and is capable of forming a homogeneous film. <P>SOLUTION: The sputtering target for a solar cell is formed by joining a target material and a backing plate by a bonding material made of an indium-tin alloy or an indium-gallium alloy. The target material is obtained by: applying a physical stress to an indium ingot; and reducing the thickness of the ingot to 70% or less of its original thickness. <P>COPYRIGHT: (C)2013,JPO&INPIT |
