| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition or the like capable of producing a resist pattern with good line edge roughness. <P>SOLUTION: A positive resist composition contains: a resin having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound represented by the formula (I), where R<SP POS="POST">1</SP>represents a hydroxy group, an alkyl group, an alicyclic hydrocarbon group, or an aromatic hydrocarbon group, and the alicyclic hydrocarbon group or the aromatic hydrocarbon group may be replaced by the hydroxy group or the alkyl group; X<SP POS="POST">1</SP>represents a divalent saturated hydrocarbon group, and -CH<SB POS="POST">2</SB>- in the divalent saturated hydrocarbon group may be replaced by -O- or -CO-; R<SP POS="POST">2</SP>represents a saturated hydrocarbon group; u1 represents an integer of 0 to 2, s1 represents 1 or 2, t1 represents 0 or 1 with the proviso that the sum of s1 and t1 is 1 or 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
