| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of efficiently manufacturing a display element on a strip-like substrate. <P>SOLUTION: There is provided an exposure apparatus EX for transferring a pattern Pm formed on a mask M to a substrate S, comprising: an illuminating unit IU for illuminating the mask M; a projecting unit PU for projecting an enlarged image of the pattern Pm onto the substrate S; and a substrate transfer unit 50 which has a first cylindrical surface 31 for holding the mask M, a mask holding section 40 which rotates in the circumferential direction of the first cylindrical surface 31 and a second cylindrical surface 32 for conveying the substrate and rotates in the circumferential direction of the second cylindrical surface 32 around the same rotation axis C as the mask holding section 40. <P>COPYRIGHT: (C)2013,JPO&INPIT |
