| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that has excellent resolution, can suppress the occurrence of a defect after development, and shows good lithographic characteristics and a pattern profile, to provide a method for forming a resist pattern, and to provide a polymer compound useful for the above resist composition and a method for producing the polymer compound. <P>SOLUTION: A resist composition comprises: a resin component (A1) having an acrylamide constitutional unit (a0) having a cyclic group containing -SO<SB POS="POST">2</SB>- in a side chain and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased by an action of an acid, in which the content ratio of the constitutional unit (a0) is less than 50 mol%; and an acid generator component (B) that generates an acid by exposure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
