发明名称 |
METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANALYSIS USING OPTICAL CRITICAL DIMENSION (OCD) METROLOGY |
摘要 |
Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.
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申请公布号 |
US2012323356(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
US201113164398 |
申请日期 |
2011.06.20 |
申请人 |
DZIURA THADDEUS G.;CHUANG YUNG-HO;TSAI BIN-MING BENJAMIN;LIU XUEFENG;HENCH JOHN J. |
发明人 |
DZIURA THADDEUS G.;CHUANG YUNG-HO;TSAI BIN-MING BENJAMIN;LIU XUEFENG;HENCH JOHN J. |
分类号 |
G06F19/00;G06F17/50 |
主分类号 |
G06F19/00 |
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