| 摘要 |
A system for controlling an infrared light distribution pattern that includes an electrowetting lens arranged proximate to an infrared light source, and operable to vary a distribution pattern of infrared light from the infrared light source into an area; an electrowetting shutter overlaying the electrowetting lens, and operable to an opaque state where infrared light from the infrared light source is blocked from projecting into at least a portion of the area, and operable to a transparent state where infrared light passes through the electrowetting shutter; an object detector configured to detect an object in the area; and a controller configured to receive a detection signal from the object detector, and operate the electrowetting lens and the electrowetting shutter in order to control the infrared light distribution pattern based on a location of the object. The pattern may be uniform or may be customized for the object being heated. |
