发明名称 |
DISPLAY DEVICE, THIN-FILM TRANSISTOR USED IN DISPLAY DEVICE, AND METHOD FOR PRODUCING THIN-FILM TRANSISTOR |
摘要 |
<p>A thin-film transistor used in a display device is provided with: a gate electrode formed on an insulating supporting substrate; a gate-insulating film formed on the supporting substrate so as to cover the gate electrode; a semiconductor layer comprising a first semiconductor layer and a second semiconductor layer and formed on the gate-insulating film; an ohmic contact layer formed on the semiconductor layer; and a source electrode and a drain electrode that are formed so as to be separated from one another on the ohmic contact layer. Therein, an etching stopper comprising spin-on-glass (SOG) is provided in the channel-forming region of the semiconductor layer.</p> |
申请公布号 |
WO2012172714(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
WO2012JP01587 |
申请日期 |
2012.03.08 |
申请人 |
PANASONIC CORPORATION;SATOH, EIICHI;KAWACHI, GENSHIROU;KAWASHIMA, TAKAHIRO |
发明人 |
SATOH, EIICHI;KAWACHI, GENSHIROU;KAWASHIMA, TAKAHIRO |
分类号 |
H01L29/786;H01L21/336;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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