发明名称 DISPLAY DEVICE, THIN-FILM TRANSISTOR USED IN DISPLAY DEVICE, AND METHOD FOR PRODUCING THIN-FILM TRANSISTOR
摘要 <p>A thin-film transistor used in a display device is provided with: a gate electrode formed on an insulating supporting substrate; a gate-insulating film formed on the supporting substrate so as to cover the gate electrode; a semiconductor layer comprising a first semiconductor layer and a second semiconductor layer and formed on the gate-insulating film; an ohmic contact layer formed on the semiconductor layer; and a source electrode and a drain electrode that are formed so as to be separated from one another on the ohmic contact layer. Therein, an etching stopper comprising spin-on-glass (SOG) is provided in the channel-forming region of the semiconductor layer.</p>
申请公布号 WO2012172714(A1) 申请公布日期 2012.12.20
申请号 WO2012JP01587 申请日期 2012.03.08
申请人 PANASONIC CORPORATION;SATOH, EIICHI;KAWACHI, GENSHIROU;KAWASHIMA, TAKAHIRO 发明人 SATOH, EIICHI;KAWACHI, GENSHIROU;KAWASHIMA, TAKAHIRO
分类号 H01L29/786;H01L21/336;H01L51/50 主分类号 H01L29/786
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