发明名称 THIN FILM TRANSISTOR PANEL AND MANUFACTURING METHOD THEREOF
摘要 Disclosed is a thin film transistor panel, comprising a substrate, an insulation layer and transparent conducting material. The insulation layer comprises projections at the back side not facing the substrate. A space between two adjacent projections is 1 μm-10 μm; the transparent conducting material is formed on the top surface and the lateral surface of the projections of the insulation layer. Otherwise, the transparent conducting material is formed on the top surface and the plane surface around the bottom of the projections or formed on the top surface, the lateral surface and the plane surface around the bottom of the projections. The present invention also discloses a manufacturing method of the thin film transistor panel.
申请公布号 US2012319277(A1) 申请公布日期 2012.12.20
申请号 US201113376593 申请日期 2011.08.11
申请人 CHUNG CHIU-YI;HE CHENG-MING;SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY, CO., LTD. 发明人 CHUNG CHIU-YI;HE CHENG-MING
分类号 H01L23/482;H01L21/768 主分类号 H01L23/482
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