发明名称 |
METHODS FOR FORMING METAL FLUORIDE FILM AND FOR MANUFACTURING OPTICAL DEVICE |
摘要 |
In a method for forming a metal fluoride film, a metal fluoride film is formed on a substrate by sputtering using a metal target and a mixed gas containing O2 gas and a reactive gas being a fluorocarbon gas. |
申请公布号 |
US2012318663(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
US201213523040 |
申请日期 |
2012.06.14 |
申请人 |
AKIBA HIDEO;CANON KABUSHIKI KAISHA |
发明人 |
AKIBA HIDEO |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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