发明名称 |
DEVICE, THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE DEVICE AND METHOD FOR MANUFACTURING THE THIN FILM TRANSISTOR |
摘要 |
A problem of the present invention is to provide a device having good characteristics and long life, wherein a functional thin film is formed in a desired region by a coating method; a thin film transistor; a method for producing the device; and a method for producing the thin film transistor. This problem can be solved by a device comprising: a substrate, a first electrode formed on the substrate, a functional thin film formed above the first electrode, and a second electrode disposed above the functional thin film, characterized by further comprising, in a region surrounding the region where the functional thin film is formed, a film containing a compound in which a group containing fluorine and aπ-conjugated system are bound together by a cycloalkene structure or a cycloalkane structure.
|
申请公布号 |
US2012319090(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
US201013510178 |
申请日期 |
2010.11.18 |
申请人 |
SHINKAI SEIJI;HARAGUCHI SHUICHI;SHIRAKE TOMOHIRO;OGAWA MASASHI;NAKATANI SHUHEI;SAKANOUE KEI;GOTO OSAMU;KAKIMOTO HIDENOBU;SUMITOMO CHEMICAL COMPANY, LIMITED;PANASONIC CORPORATION |
发明人 |
SHINKAI SEIJI;HARAGUCHI SHUICHI;SHIRAKE TOMOHIRO;OGAWA MASASHI;NAKATANI SHUHEI;SAKANOUE KEI;GOTO OSAMU;KAKIMOTO HIDENOBU |
分类号 |
H01L51/30;H01L51/40;H01L51/46;H01L51/54 |
主分类号 |
H01L51/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|